File:Rapid continues inhibition patterning.png

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Summary

Description
English: A mixture of photo initiators and photo inhibitors is used in the setup. The absorbance spectra of two material is orthogonal this allows us to control the process with the two orthogonal light sources. As the material is generated layer by layer the tray is gradually lifted and the photo inhibitors will not allow adhesion near the window.
Date
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Author SerdarWiki

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Rapid Continuous additive manufacturing by inhibition patterning

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7 January 2020

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current13:54, 5 February 2020Thumbnail for version as of 13:54, 5 February 20201,470 × 738 (53 KB)imagescommonswiki>SerdarWikiHigher resolution version

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