Engineering:Subthreshold slope

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Short description: Feature of a MOSFET's current–voltage characteristic

The subthreshold slope is a feature of a MOSFET's current–voltage characteristic.

In the subthreshold region, the drain current behaviour—though being controlled by the gate terminal—is similar to the exponentially decreasing current of a forward biased diode. Therefore, a plot of drain current versus gate voltage with drain, source, and bulk voltages fixed will exhibit approximately log-linear behaviour in this MOSFET operating regime. Its slope is the subthreshold slope.

The subthreshold slope is also the reciprocal value of the subthreshold swing Ss-th which is usually given as:[1]

[math]\displaystyle{ S_{s-th} = \ln(10) {kT \over q}\left(1+{C_d \over C_{ox}}\right) }[/math]

[math]\displaystyle{ C_d }[/math] = depletion layer capacitance

[math]\displaystyle{ C_{ox} }[/math] = gate-oxide capacitance

[math]\displaystyle{ {kT \over q} }[/math] = thermal voltage

The minimum subthreshold swing of a conventional device can be found by letting [math]\displaystyle{ \textstyle {C_{d}} \rightarrow 0 }[/math] and/or [math]\displaystyle{ \textstyle {C_{ox}} \rightarrow \infty }[/math], which yield [math]\displaystyle{ S_{s-th, \min} = \ln(10) {kT \over q} }[/math](known as thermionic limit) and 60 mV/dec at room temperature (300 K). A typical experimental subthreshold swing for a scaled MOSFET at room temperature is ~70 mV/dec, slightly degraded due to short-channel MOSFET parasitics.[2]

A dec (decade) corresponds to a 10 times increase of the drain current ID.

A device characterized by steep subthreshold slope exhibits a faster transition between off (low current) and on (high current) states.

References

  1. Physics of Semiconductor Devices, S. M. Sze. New York: Wiley, 3rd ed., with Kwok K. Ng, 2007, chapter 6.2.4, p. 315, ISBN:978-0-471-14323-9.
  2. Auth, C.; Allen, C.; Blattner, A.; Bergstrom, D.; Brazier, M.; Bost, M.; Buehler, M.; Chikarmane, V. et al. (2012). "A 22nm high performance and low-power CMOS technology featuring fully-depleted tri-gate transistors, self-aligned contacts and high density MIM capacitors". 2012 Symposium on VLSI Technology (VLSIT). pp. 131. doi:10.1109/VLSIT.2012.6242496. ISBN 978-1-4673-0847-2. 

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