| Display title | Physics:Scanning probe lithography |
| Default sort key | Scanning probe lithography |
| Page length (in bytes) | 23,982 |
| Namespace ID | 3020 |
| Namespace | Physics |
| Page ID | 443847 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Counted as a content page | Yes |
| HandWiki item ID | None |
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
| Page creator | imported>Wikisleeper |
| Date of page creation | 03:38, 5 February 2024 |
| Latest editor | imported>Wikisleeper |
| Date of latest edit | 03:38, 5 February 2024 |
| Total number of edits | 1 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
Description | Content |
Article description: (description)
This attribute controls the content of the description and og:description elements. | Scanning probe lithography (SPL) describes a set of nanolithographic methods to pattern material on the nanoscale using scanning probes. It is a direct-write, mask-less approach which bypasses the diffraction limit and can reach resolutions below 10 nm. It is considered an alternative lithographic... |
