Engineering:Hardmask
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Revision as of 07:54, 5 August 2021 by imported>PolicyEnforcerIA (attribution)
A hardmask is a material used in semiconductor processing as an etch mask instead of a polymer or other organic "soft" resist material. The idea is that polymers tend to be etched easily by oxygen, fluorine, chlorine or other reactive gases to the extent that a pattern defined using a polymeric mask is rapidly degraded during plasma etching.
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