Engineering:Remote plasma: Difference between revisions
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Latest revision as of 23:11, 3 February 2024
A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a location remote from the plasma in the plasma afterglow.[1][2]
See also
- Chemical vapor deposition
- Corona treatment
- Physical vapor deposition
- Plasma activation
- Plasma chemistry
- Plasma cleaning
- Plasma-activated bonding
- Reactive ion etching
References
- ↑ Tommi Kääriäinen; David Cameron; Marja-Leena Kääriäinen; Arthur Sherman (17 May 2013). Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications. Wiley. pp. 21–. ISBN 978-1-118-74742-1. https://books.google.com/books?id=Yjeid_cf5AcC&pg=PA21.
- ↑ Alexander Fridman (5 May 2008). Plasma Chemistry. Cambridge University Press. pp. 532–. ISBN 978-1-139-47173-2. https://books.google.com/books?id=ZzmtGEHCC9MC&pg=PA532.
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