Category:Plasma processing

• Plasma processing (engineering)

C

• Chemical vapor deposition (chemistry)

K

• Kjellberg Finsterwalde (company)

L

• Low-energy plasma-enhanced chemical vapor deposition (chemistry)

N

• Nitriding (engineering)
• Nonequilibrium Gas and Plasma Dynamics Laboratory (organization)

P

• Physical vapor deposition (physics)
• Plasma activation (engineering)
• Plasma gasification (engineering)
• Plasma arc welding (engineering)
• Plasma ashing (engineering)
• Plasma cleaning (engineering)
• Plasma cutting (engineering)
• Plasma etcher (engineering)
• Plasma etching (engineering)
• Plasma gasification commercialization (engineering)
• Plasma polymerization (chemistry)
• Piezoelectric direct discharge plasma (engineering)
• Plasma torch (physics)
• Plasma-enhanced chemical vapor deposition (chemistry)

R

• Reactive-ion etching (engineering)
• Remote plasma (engineering)

S

• Solution precursor plasma spray (engineering)
• Sputter deposition (physics)
• Suspension plasma spray (engineering)