Engineering:10 µm process
From HandWiki
The 10 μm process is the level of MOSFET semiconductor process technology that was commercially reached around 1971,[1][2] by leading semiconductor companies such as RCA and Intel.
In 1960, Egyptian-American engineer Mohamed M. Atalla and Korean-American engineer Dawon Kahng, while working at Bell Labs, demonstrated the first MOSFET transistors with 20 μm and then 10 μm gate lengths.[3][4] In 1969, Intel introduced the 1101 MOS SRAM chip with a 12 μm process.[5][6][7]
Products featuring 10 μm manufacturing process
- RCA's CD4000 series of integrated circuits began with a 20 μm process in 1968, before gradually downscaling and eventually reaching 10 μm in the next several years.[8]
- Intel 1103, an early dynamic random-access memory (DRAM) chip launched in 1970, used an 8 μm process.[9]
- Intel 4004 CPU launched in 1971 was manufactured using a 10 μm process.[10]
- Intel 8008 CPU launched in 1972 was manufactured using this process.[10]
References
- ↑ Mueller, S (2006-07-21). "Microprocessors from 1971 to the Present". informIT. http://www.informit.com/articles/article.aspx?p=482324&seqNum=2. Retrieved 2012-05-11.
- ↑ Myslewski, R (2011-11-15). "Happy 40th birthday, Intel 4004!". TheRegister. Archived from the original on 2015-04-19. https://web.archive.org/web/20150419173435/http://www.theregister.co.uk/Print/2011/11/15/the_first_forty_years_of_intel_microprocessors/. Retrieved 2015-04-19.
- ↑ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. pp. 321–3. ISBN 9783540342588.
- ↑ Voinigescu, Sorin (2013). High-Frequency Integrated Circuits. Cambridge University Press. p. 164. ISBN 9780521873024. https://books.google.com/books?id=71dHe1yb9jgC&pg=PA164.
- ↑ "A chronological list of Intel products. The products are sorted by date.". Intel museum. Intel Corporation. July 2005. Archived from the original on August 9, 2007. https://web.archive.org/web/20070809053720/http://download.intel.com/museum/research/arc_collect/timeline/TimelineDateSort7_05.pdf. Retrieved July 31, 2007.
- ↑ "1970s: SRAM evolution". http://www.shmj.or.jp/english/pdf/ic/exhibi724E.pdf. Retrieved 27 June 2019.
- ↑ Pimbley, J. (2012). Advanced CMOS Process Technology. Elsevier. p. 7. ISBN 9780323156806. https://books.google.com/books?id=8EUWHSqevQoC&pg=PA7.
- ↑ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. p. 330. ISBN 9783540342588. https://books.google.com/books?id=2cu1Oh_COv8C&pg=PA330.
- ↑ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. pp. 362–363. ISBN 9783540342588. https://books.google.com/books?id=2cu1Oh_COv8C&pg=PA362. "The i1103 was manufactured on a 6-mask silicon-gate P-MOS process with 8 μm minimum features. The resulting product had a 2,400 μm, 2 memory cell size, a die size just under 10 mm2, and sold for around $21."
- ↑ 10.0 10.1 "History of the Intel Microprocessor - Listoid". Archived from the original on 2015-04-27. https://web.archive.org/web/20150427124729/http://www.listoid.com/list/142. Retrieved 2015-04-19.
External links
| Preceded by 20 μm process |
MOSFET semiconductor device fabrication process | Succeeded by 6 μm process |
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